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Category:2000 software
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Category:Windows text-related softwareComputerized cytologic detection of malignancy on fine needle aspiration biopsy.
The authors present findings from a study to examine the accuracy of computerized cytologic detection of malignancy on aspiration biopsy. Digital images of cell-bearing slides of fine needle aspiration biopsy (FNAB) (samples of 128 smears with subsequent diagnosis of malignancy and 128 smears with cytologic diagnosis of benign neoplasia, and 124 smears with cytologic diagnoses of other than malignant neoplasia) were processed to produce computer-readable images. The slides were scanned by multiple methods to produce three and four image sets, respectively, from each slide: one set corresponding to a B-scan image and one to a 3-D feature image for each cell. A panel consisting of pathologists and an additional 10 experienced cytotechnologists viewed the images and attempted to classify the slides as malignant, benign or either. For the detection of malignant lesions, the sensitivities of the three and four image sets were 98% and 94% respectively and the specificities 94% and 97% respectively. For the detection of benign lesions, the sensitivities of the three and four image sets were 84% and 96% respectively and the specificities were 95% and 100% respectively. On the basis of these results, computer-generated images can be useful adjuncts to conventional cytologic analysis in detecting malignancy in samples from FNAB.Prevention and management of hyperkalemia.
Hyperkalemia is a common medical problem that may lead to severe metabolic and electrocardiographic abnormalities. It is usually encountered in patients with specific disease states, such as chronic kidney disease, nephrotic syndrome, or diabetes mellitus. Treatment is directed at the underlying pathophysiologic process causing hyperkalemia and the primary risk factors. Clinicians should be aware that hyperkalemia requires prompt and aggressive treatment in order to minimize the cardiovascular effects of hyperkalemia.Q:
Postgresql create index on column with unique constraints
I am using Postgresql 9.6 and I have run a command like this:
create index on mytable (col1, col2) where col3=’somevalue’;
I found out that the above command violates the unique constraints on the table (or at least the where clause part).
Is there a way
Sep 16, 2013
Troubleshooting Tips To Diagnose Electrical Problems & Fix Solutions. com. See more Guitar tutorial.. CutMaster 2D for Mac. For 1st time buyers of CutMaster 2D.The present invention generally relates to apparatus and methods for processing substrates and more particularly relates to processing a substrate using a plasma reactor and plasma source which is capable of depositing and etching films and substrates.
A plasma reactor is used to deposit and/or etch various materials and film on substrates such as semiconductor wafers. Generally, a plasma reactor contains a housing which is divided into a vacuum chamber and a gas treatment chamber. A substrate is disposed in the vacuum chamber. A vacuum pump evacuates the vacuum chamber and exhausting the gases from the gas chamber. The vacuum pump is typically a turbomolecular pump. After the substrate has been properly prepared, the substrate is transferred into the gas treatment chamber by opening the gate to the chamber. In the gas treatment chamber, the plasma source is energized by a radio frequency (RF) power supply. In such a system, a dielectric plate and back plate are typically disposed in the gas treatment chamber. A couple of coaxial antennas are disposed on the dielectric plate. One antenna is wound on the front surface of the dielectric plate, facing the vacuum chamber. Another antenna is wound on the back surface of the dielectric plate, facing the gas treatment chamber. A RF power supply connected to the coaxial antennas is used to excite the plasma in the gas treatment chamber and thus remove impurities from the substrate surface.
In the plasma reactor described above, there is an RF power coupling factor (i.e., the RF power coupling efficiency) between the RF power supply and the antenna which is wound on the dielectric plate. This coupling factor is a very important parameter for controlling the activation and etching processes in the plasma reactor. In order to control such a coupling factor, it is typically required to measure the RF power coupling factor between the RF power supply and the antenna, taking into consideration the RF power distribution on the substrate surface.
One of the most commonly used methods for measuring an RF power coupling factor is to measure the RF voltage distribution across the substrate surface by using a non-contact voltage measuring device. However, such a method cannot be used in semiconductor manufacturing, because semiconductor processing is a clean environment.
Another commonly used method for measuring an RF power coupling factor is to
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